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Optimization of multi-step development scheme to improve the critical dimension uniformity

Author(s):
  • Chang, H. ( United Microelectronics Corp. (Taiwan) )
  • Lin, B. S. -M. ( United Microelectronics Corp. (Taiwan) )
  • Hung, K. -C. ( United Microelectronics Corp. (Taiwan) )
  • Fang, S. -P. ( United Microelectronics Corp. (Taiwan) )
  • Hsu, T. ( United Microelectronics Corp. (Taiwan) )
Publication title:
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5755
Pub. Year:
2005
Page(from):
251
Page(to):
259
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457356 [0819457353]
Language:
English
Call no.:
P63600/5755
Type:
Conference Proceedings

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