Advanced method for run-to-run control of photolithography overlay registration in high-mix semiconductor production
- Author(s):
- Toprac, A. J. ( Yield Dynamics, Inc. (USA) )
- Wang, Y. ( Yield Dynamics, Inc. (USA) )
- Publication title:
- Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5755
- Pub. Year:
- 2005
- Page(from):
- 1
- Page(to):
- 8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457356 [0819457353]
- Language:
- English
- Call no.:
- P63600/5755
- Type:
- Conference Proceedings
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