Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography
- Author(s):
- Serebriakov, A. ( Delft Univ. of Technology (Netherlands) )
- Bociort, F. ( Delft Univ. of Technology (Netherlands) )
- Braat, J. ( Delft Univ. of Technology (Netherlands) )
- Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1780
- Page(to):
- 1791
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Effect of obstructions on the design of reflective ring-field projection systems
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Influence of multilayers on the optical performance of extreme-ultraviolet projection systems
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Network structure of the set of local minima in optical system optimization
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Saddle points in the merit function landscape of systems of thin lenses in contact
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |