Blank Cover Image

Requirement of in-field illumination control for low k1 imaging below 0.3

Author(s):
Hwang, C. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Shin, J. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Lee, S.-J. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1548
Page(to):
1556
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Hwang, C., Nam, D.-S., Park, J.-H., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Synthesis and Thermoelectric Properties of N-Type Bi2Te2.7Se0.3 Compounds by Spark Plasma Sintering

Cho, D. C., Lim, C. H., Kim, K. T., Shin, S. Y., Lee, D. M., Lee, Y. S., Lee, C. H.

Trans Tech Publications
2 Conference Proceedings Investigation on polarization monitoring mask: pattern design and experimental verification [6152-60]

Hwang, C., Park, D. W., Shin, J. H., Nam, D. S., Lee, S. J, Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J., Kim, I., Hwang, C., Park, D.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, J.-Y., Shin, J., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Macro analysis of line edge and line width roughness [6152-33]

Shin, J., Yoon, J., Jung, Y., Lee, S., Woo, S. G., Cho, H. -K., Moon, J. -T.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Lee, S., Hwang, C., Park, D.-W., Kim, I.-S., Kim, H.-C., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Kang, Y.S., Nam, D.-S., Hwang, C., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Feasibility of very low k1(=0.31) KrF lithography

Kim,I.-S., Kim,B.-S., Lee,J.-H., Cho,H.-K., Moon,J.-T.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings CD control at low K1 optical lithography in DRAM device

Hong, J., Woo, C., Park, J., Cho, B., Choi, J.-S., Yang, H., Park, C., Shin, Y.-C., Kim, Y., Jeong, G., Kim, J., Kang, …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12