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Requirement of in-field illumination control for low k1 imaging below 0.3

Author(s):
Hwang, C. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Shin, J. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Lee, S.-J. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (Soufh Korea) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1548
Page(to):
1556
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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