Tunable transmission phase mask options for 65/45nm node gate and contact processing
- Author(s):
Kasprowicz, B. S. ( Photronics (USA) ) Conley, W. ( Freescaie Semlconductor (USA) ) Ham, Y.-M. ( Photronics (USA) ) Cangemi, M. J. ( Photronics (USA) ) Morgana, N. ( Photronics (France) ) Cottle, R. ( Photronics (USA) ) Progler, C. J. ( Photronics (USA) ) Wu, W. ( Freescale Semiconductor (USA) ) Litt, L. C. ( Freescale Semiconductor (USA) ) Cobb, J. ( Freescale Semiconductor (USA) ) Roman, B. ( Freescale Semiconductor (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1469
- Page(to):
- 1477
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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