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The problem of optimal placement of sub-resolution assist features (SRAF)

Author(s):
Mukherjee, M. ( IBM Microelectronics Div. (USA) )
Mansfield, S. ( IBM Microelectronics Div. (USA) )
Liebmann, L. ( IBM Microelectronics Div. (USA) )
Lvov, A. ( IBM Research Div. (USA) )
Papadapoulou, E. ( IBM Research Div. (USA) )
Lavin, M. ( IBM Research Div. (USA) )
Zhao, Z. ( IBM Microelectronics Div. (USA) )
2 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1417
Page(to):
1429
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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