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Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era

Author(s):
  • Kim, Y.-S. ( Hynix Semiconductor Inc. (South Korea) )
  • Hyun, Y.-S. ( Hynix Semiconductor Inc. (South Korea) )
  • Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, H. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, B.-H. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. date:
2005
Pt.:
3
Page(from):
1388
Page(to):
1394
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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