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Mask enhancer technology for 45-nm node contact hole fabrication

Author(s):
Yuito, T. ( IMEC (Belgium) and Matsushita Electric Industrial Co., Ltd. (Japan) )
Wiaux, V. ( IMEC (Belgium) )
Look, L. Van ( IMEC (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
Irie, S. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
Matsuo, T. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
Misaka, A. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
Watanabe, H. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
Sasago, M. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
4 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
3
Page(from):
1377
Page(to):
1387
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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