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Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

Author(s):
Fang, S. P. ( United Microelectronics Corp. (Taiwan) )
Yang, H. ( United Microelectronics Corp. (Taiwan) )
Chang, H. ( United Microelectronics Corp. (Taiwan) )
Chiang, P. ( United Microelectronics Corp. (Taiwan) )
Lin, B. S.-M. ( United Microelectronics Corp. (Taiwan) )
Hung, K.-C. ( United Microelectronics Corp. (Taiwan) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. date:
2005
Pt.:
3
Page(from):
1367
Page(to):
1376
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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