Investigation of polarization effects on new mask materials

Investigation of polarization effects on new mask materials

Author(s):

Itakura, Y. ( Komatsu Ltd. (Japan) )

Kawasa, Y. ( Komatsu Ltd. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Moriya, M. ( Komatsu Ltd. (Japan) )

Nagai, S. ( Komatsu Ltd. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tsuji, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Wakamiya, W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

6 more

Publication title:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5754

Pub. Year:

2005

Pt.:

1

Page(from):

587

Page(to):

598

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

Language:

English

Call no.:

P63600/5754

Type:

Conference Proceedings

Details

TDL ID:	ZA00014979
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2005 : 18th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.04
Note for article:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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