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Three-dimensional rigorous simulation of mask-induced polarization

Author(s):
Zhou, W. ( UMC Lfd. (Singapore) )
Yu, J. ( UMC Lfd. (Singapore) )
Lo, J. ( UMC Lfd. (Singapore) )
Liu, J. ( UMC Lfd. (Singapore) )
Tjhin, H. ( KLA-Tencor Corp. (USA) )
Dziura, T. G. ( KLA-Tencor Corp. (USA) )
1 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
567
Page(to):
575
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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