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Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology

Author(s):
  • Nam, D. ( Samsung Electronics Co. (South Korea) )
  • Milster, T. D. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
  • Chen, T. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. date:
2005
Pt.:
1
Page(from):
355
Page(to):
367
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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