Layout and source dependent transmission tuning
- Author(s):
Kiefer, R. ( DuPont Photomasks, Inc. (USA) ) Jackson, C. ( DuPont Photomasks, Inc. (USA) ) Garg, V. ( DuPont Photomasks, Inc. (USA) ) Mellenthin, D. ( DuPont Photomasks, Inc. (USA) ) Manfredo, J. ( DuPont Photomasks, Inc. (USA) ) Buck, P. ( DuPont Photomasks, Inc. (USA) ) Cohen, S. ( DuPont Photomasks, Inc. (USA) ) Morgante, C. ( Etec Systems Inc./Applied Materials, Inc. (USA) ) Allen, P. C. ( Etec Systems Inc./Applied Materials, Inc. (USA) ) White, M. ( Etec Systems Inc./Applied Materials, Inc. (USA) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 315
- Page(to):
- 326
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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