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A methodology for the characterization of topography induced immersion bubble defects

Author(s):
Warrick, S. ( Freescale Semiconductor (France) )
Hinnen, P. ( ASML (Netherlands) )
Morton, R. ( Philips Semiconductors (France) )
Cooper, K. ( Freescale Semiconductor (France) )
Sassoulas, P.-O. ( STMicroelectronics (France) )
Depre, J. ( ASML (Netherlands) )
Navarro, R. ( ASML (Netherlands) )
van Haren, R. ( ASML (Netherlands) )
Browning, C. ( Freescale Semiconductor (France) )
Reber, D. ( Freescale Semiconductor (France) )
Megens, H. ( ASML (Nefherlands) )
6 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. date:
2005
Pt.:
1
Page(from):
154
Page(to):
163
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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