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First microprocessors with immersion lithography

Author(s):
Lee, D.-Y. ( Samsung Electronics (South Korea) )
Kim, I.-S. ( Samsung Electronics (South Korea) )
Jung, S.-G. ( Samsung Electronics (South Korea) )
Jung, M.-H. ( Samsung Electronics (South Korea) )
Park, J.-O. ( Samsung Electronics (South Korea) )
Oh, S.-H. ( Samsung Electronics (South Korea) )
Woo, S.-G. ( Samsung Electronics (South Korea) )
Cho, H.-K. ( Samsung Electronics (South Korea) )
Moon, J.-T. ( Samsung Electronics (South Korea) )
4 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
119
Page(to):
128
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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