Hyper-numerical aperture imaging challenges for 193 nm

Hyper-numerical aperture imaging challenges for 193 nm

Author(s):

Mizoguchi, H. ( Gigaphoton Inc. (Japan) )

Inoue, T. ( Ushio Inc. (Japan) )

Fujimoto, J. ( Komatsu Ltd. (Japan) )

Yamazaki, T. ( Komatsu Ltd. (Japan) )

Suzuki, T. ( Komatsu Ltd. (Japan) )

Matsunaga, T. ( Komatsu Ltd. (Japan) )

Sakanishi, S. ( Komatsu Ltd. (Japan) )

Kaminishi, M. ( Komatsu Ltd. (Japan) )

Watanabe, Y. ( Komatsu Ltd. (Japan) )

Ohta, T. ( Komatsu Ltd. (Japan) )

Nakane, M. ( Komatsu Ltd. (Japan) )

Moriya, M. ( Komatsu Ltd. (Japan) )

Nakaike, T. ( Komatsu Ltd. (Japan) )

Shinbori, M. ( Ushio Inc. (Japan) )

Yoshino, M. ( Ushio Inc. (Japan) )

Kawasuji, T. ( Komatsu Ltd. (Japan) )

Nogawa, H. ( Komatsu Ltd. (Japan) )

Ito, T. ( Komatsu Ltd. (Japan) )

Umeda, H. ( Komatsu Ltd. (Japan) )

Tanaka, S. ( Ushio Inc. (Japan) )

Taniguchi, H. ( Ushio Inc. (Japan) )

Sasaki, Y. ( Ushio Inc. (Japan) )

Kinoshita, J. ( Ushio Inc. (Japan) )

Abe, T. ( Ushio Inc. (Japan) )

Tanaka, H. ( Komatsu Ltd. (Japan) )

Hayashi, H. ( Komatsu Ltd. (Japan) )

Miyao, K. ( Ushio Inc. (Japan) )

Niwano, M. ( Komatsu Ltd. (Japan) )

Kurosu, A. ( Komatsu Ltd. (Japan) )

Yashiro, M. ( Ushio Inc. (Japan) )

Nagano, H. ( Ushio Inc. (Japan) )

Matsui, N. ( Komatsu Ltd. (Japan) )

Mimura, T. ( Komatsu Ltd. (Japan) )

Kakizaki, K. ( Ushio Inc. (Japan) )

Goto, M. ( Komatsu Ltd. (Japan) )

30 more

Publication title:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5754

Pub. Year:

2005

Pt.:

1

Page(from):

69

Page(to):

79

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

Language:

English

Call no.:

P63600/5754

Type:

Conference Proceedings

Details

TDL ID:	ZA00014979
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2005 : 18th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.03.01-2005.03.04
Note for article:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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