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Resist blur and line edge roughness (Invited Paper)

Author(s):
Zhang, G. ( Texas Instruments Inc. (USA) )
Terry, M. ( Texas Instruments Inc. (USA) )
O'Brien, S. ( Texas Instruments Inc. (USA) )
Soper, R. ( Texas Instruments Inc. (USA) )
Mason, M. ( Texas Instruments Inc. (USA) )
Kim, W. ( Texas Instruments Inc. (USA) )
Wang, C. ( Texas Instruments Inc. (USA) )
Hansen, S. ( ASML (USA) )
Lee, J. ( ASML (USA) )
Ganeshan, J. ( ASML (USA) )
5 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
38
Page(to):
52
Pages:
15
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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