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Characterization of ArF immersion process for production (Invited Paper)

Author(s):
Kohler, C. ( ASML Netherlands B.V. (Netherlands) )
de Boeij, W. ( ASML Netherlands B.V. (Netherlands) )
van Ingen-Schenau, K. ( ASML Netherlands B.V. (Netherlands) )
van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) )
de Klerk, J. ( ASML Netherlands B.V. (Netherlands) )
Kok, H. ( ASML Netherlands B.V. (Netherlands) )
Swinkels, G. ( ASML Netherlands B.V. (Netherlands) )
Finders, J. ( ASML Netherlands B.V. (Netherlands) )
Mulkens, J. ( ASML Netherlands B.V. (Netherlands) )
Fiolka, D. ( Carl Zeiss SMT AG (Germany) )
Heil, T. ( Carl Zeiss SMT AG (Germany) )
6 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
1
Page(from):
13
Page(to):
22
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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