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Nanomolecular resists with adamantane core for 193-nm lithography

Author(s):
Kim, S.-K. ( Hanyang Univ. (South Korea) )
An, I. ( Hanyang Univ. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
Lee, S. M. ( Seoul National Univ. (Soufh Korea) )
Bok, C. K. ( Hynix Semiconducfor Inc. (South Korea) )
Moon, S. C. ( Hynix Semiconducfor Inc. (South Korea) )
1 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
603
Page(to):
610
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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