Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist
- Author(s):
Kim, S.-K. ( Hanyang Univ. (South Korea) ) An, I. ( Hanyang Univ. (South Korea) ) Oh, H.-K. ( Hanyang Univ. (South Korea) ) Lee, S. M. ( Seoul National Univ. (South Korea) ) Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 592
- Page(to):
- 602
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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