Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography
- Author(s):
Lee, C. H. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, K. S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kang, H. Y. ( Hanyang Univ. (South Korea) ) Oh, H. W. ( Hanyang Univ. (South Korea) ) Lee, J. E. ( Hanyang Univ. (South Korea) ) Kim, K. M. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y. H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, T. S. ( Samsung Electronics Co., Ltd. (South Korea) ) Oh, H.-K. ( Hanyang Univ. (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 564
- Page(to):
- 571
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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