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Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Author(s):
Lee, C. H. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, K. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, H. Y. ( Hanyang Univ. (South Korea) )
Oh, H. W. ( Hanyang Univ. (South Korea) )
Lee, J. E. ( Hanyang Univ. (South Korea) )
Kim, K. M. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y. H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, T. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
5 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
564
Page(to):
571
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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