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Material design and evaluation of nanocomposite resist for next generation lithography

Author(s):
  • Kim, J.-B. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Kim, K.-S. ( Korea Advanced Institute of Science and Technology (South Korea) )
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
467
Page(to):
475
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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