Organosiloxane based bottom antireflective coatings for 193nm lithography
- Author(s):
Son, E.-K. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Kim, J.-W. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Lee, S.-H. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Park, C.-S. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Lee, J.-W. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd. (Soufh Korea) ) Lee, G.-S. ( Hynix Semlconductor Inc. (South Korea) ) Lee, S.-K. ( Hynix Semlconductor Inc. (South Korea) ) Ban, K.-D. ( Hynix Semlconductor Inc. (South Korea) ) Jung, J.-C. ( Hynix Semlconductor Inc. (South Korea) ) Bok, C. K. ( Hynix Semlconductor Inc. (South Korea) ) Moon, S.-C. ( Hynix Semlconductor Inc. (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 449
- Page(to):
- 458
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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