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New shrinkage technology for nano-contact hole formation

Author(s):
Oh, S. K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. Y. ( Dongjin Semichem Co., Ltd. (South Korea) )
Jung, Y. H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, J. W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D. B. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, G. S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, S. K. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K. D. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J. C. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
7 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. date:
2005
Pt.:
1
Page(from):
181
Page(to):
186
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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