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A new 193nm resist

Author(s):
Hirayama, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Shiono, D. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Matsumaru, S. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Ogata, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Hada, H. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Onodera, J. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Arai, T. ( Hitachi, Ltd. (Japan) )
Sakamizu, T. ( Hitachi, Ltd. (Japan) )
Yamaguchi, A. ( Hitachi, Ltd. (Japan) )
Shiraishi, H. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Ueda, M. ( Tokyo Institute of Technology (Japan) )
7 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. date:
2005
Pt.:
1
Page(from):
122
Page(to):
130
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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