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Resist component leaching in 193-nm immersion lithography

Author(s):
Chapon, J.-D. ( STMicroelectronics (France) )
Chaton, C. ( CEA-LETI (France) )
Gouraud, P. ( STMicroelectronics (France) )
Broekaart, M. ( Philips Semiconductors (France) )
Warrick, S. ( Freescale Semiconductor, Inc. (France) )
Guilmeau, I. ( CEA-LETI (France) )
Trauiller, Y. ( CEA-LETI (France) )
Belledent, J. ( Philips Semiconductors (France) )
3 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
95
Page(to):
101
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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