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Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography

Author(s):
Ganesan, R. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Choi, J.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Yun, H.-J. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kwon, Y.-G. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kim, K.-S. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Oh, T.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kim, J.-B. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
2 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(1)
Pub. Year:
2005
Pt.:
1
Page(from):
40
Page(to):
51
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-1
Type:
Conference Proceedings

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