Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography
- Author(s):
Ganesan, R. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Choi, J.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Yun, H.-J. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Kwon, Y.-G. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Kim, K.-S. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Oh, T.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) Kim, J.-B. ( Korea Advanced Instifute of Sclence and Technology (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 40
- Page(to):
- 51
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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