Scatterometry based 65nm node CDU analysis and prediction using novel reticle measurement technique
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5752
- Pub. Year:
- 2005
- Page(from):
- 1312
- Page(to):
- 1322
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457325 [0819457329]
- Language:
- English
- Call no.:
- P63600/5752-3
- Type:
- Conference Proceedings
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