Accurate alignment technique for nanoimprint lithography

Accurate alignment technique for nanoimprint lithography

Author(s):

Kang, H.-B. ( Phofronics-PKL R&D Ctr. (South Korea) )
Kim, J.-M. ( Phofronics-PKL R&D Ctr. (South Korea) )
Kim, Y.-D. ( Phofronics-PKL R&D Ctr. (South Korea) )
Cho, H.-J. ( Phofronics-PKL R&D Ctr. (South Korea) )
Choi, S.-S. ( Phofronics-PKL R&D Ctr. (South Korea) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5752

Pub. Year:

2005

Page(from):

429

Page(to):

437

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457325 [0819457329]

Language:

English

Call no.:

P63600/5752-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014974
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2005 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.02.28-2005.03.03

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