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90nm technology contact CD performance characterization via ODP scatterometry

Author(s):
Jeon, B.-T. ( Dongbu-Anam Semiconductor (South Korea) )
Kim, O.-H. ( Dongbu-Anam Semiconductor (South Korea) )
Baik, J.-H. ( Dongbu-Anam Semiconductor (South Korea) )
Ha, J.-H. ( Dongbu-Anam Semiconductor (South Korea) )
Lee, I.-H. ( Dongbu-Anam Semiconductor (South Korea) )
Yang, W.-S. ( Dongbu-Anam Semiconductor (South Korea) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
140
Page(to):
143
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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