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The sidewall angle dependence of CDSEM measurements and its impact on CD process control

Author(s):
  • Koike, T. ( Semiconductor Co., Toshiba Corp. (Japan) )
  • Asano, M. ( Semiconductor Co., Toshiba Corp. (Japan) )
  • Mikami, T. ( Semiconductor Co., Toshiba Corp. (Japan) )
  • Yamazaki, Y. ( Semiconductor Co., Toshiba Corp. (Japan) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
19
Page(to):
29
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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