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In-line-focus monitoring technique using lens aberration effect

Author(s):
  • Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, J. ( Hynix Semiconductor Inc. (South Korea) )
  • Cho, B. ( Hynix Semiconductor Inc. (South Korea) )
  • Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
1
Page(to):
8
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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