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Plasma pinch EUV source with particle injection

Author(s):
Neumann, M. J. ( Univ. of Illinois at Urbana-Champaign (USA) )
Shin, H. ( Univ. of Illinois at Urbana-Champaign (USA) )
Qiu, H. ( Univ. of Illinois at Urbana-Champaign (USA) )
Ritz, E. ( Univ. of Illinois at Urbana-Champaign (USA) )
DeFrees, R. A. ( Univ. of Illinois at Urbana-Champaign (USA) )
Hendricks, M. R. ( Univ. of Illinois at Urbana-Champaign (USA) )
Alman, D. A. ( Univ. of Illinois at Urbana-Champaign (USA) )
Jurczyk, B. E. ( Univ. of Illinois at Urbana-Champaign (USA) )
Ruzic, D. N. ( Univ. of Illinois at Urbana-Champaign (USA) )
Bristol, R. ( Intel Components Research (USA) )
5 more
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. date:
2005
Page(from):
556
Page(to):
562
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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