BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography
- Author(s):
- Cain, J. P. ( Univ. of California/Berkeley (USA) )
- Naulleau, P. ( Lawrence Berkeley National Lab. (USA) )
- Spanos, C. J. ( Univ. of California/Berkeley (USA) )
- Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 527
- Page(to):
- 537
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Resist sensitivity and thickness-based beam count optimization for parallel low energy E-beam exposure systems
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Modeling within-field gate length spatial variation for process-design co-optimization
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Substrate smoothing for high-temperature condenser operation in EUVL source environments
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Optimum sampling for characterization of systematic variation in photolithography
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Compact formulation of mask error factor for critical dimension control in optical lithography
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Electrical linewidth metrology for systematic CD variation characterization and causal analysis
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Across-wafer CD uniformity control through lithography and etch process: experimental verification
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |