The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies
- Author(s):
- Fritze, M. ( MIT Lincoln Lab. (USA) )
- Tyrrell, B. ( MIT Lincoln Lab. (USA) )
- Fedynyshyn, T. ( MIT Lincoln Lab. (USA) )
- Rothschild, M. ( MIT Lincoln Lab. (USA) )
- Brooker, P. ( Sigma-Cad, Inc. (USA) )
- Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 483
- Page(to):
- 490
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
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