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Complexity reduction for C4 compression for implementation in maskless lithography datapath

Author(s):
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. date:
2005
Page(from):
366
Page(to):
381
Pages:
16
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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