Recent results on EUV mask blank multilayers and absorbers

Author(s):

Furukawa, H. ( Institute for Laser Technology (Japan) )

Kawamura, T. ( Tokyo Institute of Technology (Japan) )

Nishikawa, T. ( Okayama Univ. (Japan) )

Sasaki, A. ( Japan Atomic Energy Research Insfitute (Japan) )

Fujima, K. ( Yamanashi Univ. (Japan) )

Fujioka, S. ( Institute of Laser Engineering, Osaka Univ. (Japan) )

Nishimura, H. ( Institute of Laser Engineering, Osaka Univ. (Japan) )

Nishihara, K. ( Institute of Laser Engineering, Osaka Univ. (Japan) )

Miyanaga, N. ( Institute of Laser Engineering, Osaka Univ. (Japan) )

Izawa, Y. ( Institute of Laser Engineering, Osaka Univ. (Japan) )

Yamanaka, C. ( Institute for Laser Technology (Japan) )

6 more

Publication title:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5751

Pub. Year:

2005

Page(from):

190

Page(to):

199

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

Language:

English

Call no.:

P63600/5751-1

Type:

Conference Proceedings