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Development of the ASML EUV alpha demo tool

Author(s):
Romeo, C. ( ST Microelectronics S.r.l. (Italy) )
Cantu, P. ( ST Microelectronics S.r.l. (Italy) )
Henry, D. ( ST Microelectronics (France) )
Takekoshi, H. ( Nikon Corp. (Japan) )
Hirayanagi, N. ( Nikon Corp. (Japan) )
Suzuki, K. ( Nikon Corp. (Japan) )
McCallum, M. ( Nfkon Precision Europe GmbH (United Kingdom) )
Fujita, H. ( Dai Nippon Prinfing Co., Ltd. (Japan) )
Takikawa, T. ( Dai Nippon Prinfing Co., Ltd. (Japan) )
Hoga, M. ( Dai Nippon Prinfing Co., Ltd. (Japan) )
5 more
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. Year:
2005
Page(from):
90
Page(to):
101
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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