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One small step: world's first integrated EUVL process line

Author(s):
  • Kim, S.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Chalyck, R. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5751
Pub. Year:
2005
Page(from):
64
Page(to):
77
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
Language:
English
Call no.:
P63600/5751-1
Type:
Conference Proceedings

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