Maskless optical lithography using MEMS-based spatial light modulators (Invited Paper)

Maskless optical lithography using MEMS-based spatial light modulators (Invited Paper)

Author(s):

Menon, R. ( Massachusetts Institute of Technology (USA) )
Patel, A. ( Massachusetts Institute of Technology (USA) )
Smith, H.I. ( Massachusetts Institute of Technology (USA) )

Publication title:

MOEMS Display and Imaging Systems III

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5721

Pub. Year:

2005

Page(from):

53

Page(to):

63

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456953 [0819456950]

Language:

English

Call no.:

P63600/5721

Type:

Conference Proceedings

Details

TDL ID:	ZA00014938
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : MOEMS Display and Imaging Systems
Conf. info. (Number):	2005 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2005.01.24-2005.04.25

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