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Study on high-accuracy displacement interferometer for lithography application

Author(s):
  • Cheng, Z. ( Shanghai Institute of Optics and Fine Mechanics, CAS(China) )
  • Gao, H. ( Shanghai Institute of Optics and Fine Mechanics, CAS(China) )
  • Chai, X. ( Shanghai Institute of Optics and Fine Mechanics, CAS(China) )
  • Ning, Z. ( Shanghai Institute of Optics and Fine Mechanics, CAS(China) )
  • Huang, H. ( Shanghai Institute of Optics and Fine Mechanics, CAS(China) )
Publication title:
Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5662
Pub. Year:
2004
Page(from):
395
Page(to):
399
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456236 [0819456233]
Language:
English
Call no.:
P63600/5662
Type:
Conference Proceedings

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