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Lithography in UV photoresist using NSOM

Author(s):
  • Lin, Y. ( Data Storage Institute(Singapore), National Univ. of Singapore(Singapore) )
  • Hong, M. H. ( Data Storage Institute(Singapore), National Univ. of Singapore(Singapore) )
  • Wang, W. J. ( Data Storage Institute(Singapore) )
  • Law, Y. Z. ( National Univ. of Singapore(Singapore) )
  • Chong, T. C. ( Data Storage Institute(Singapore), National Univ. of Singapore(Singapore) )
Publication title:
Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5662
Pub. Year:
2004
Page(from):
77
Page(to):
82
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456236 [0819456233]
Language:
English
Call no.:
P63600/5662
Type:
Conference Proceedings

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