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Volume-change thermal-lithography technique for ultra-high density optical ROM mastering process(Invited Paper)

Author(s):
  • Kuwahara, M. ( National Institute of Advanced Industrial Science and Technology(Japan) )
  • Kim, J. ( Samsung Electronics Co. , Ltd. (South Korea) )
  • Yoon, D. ( Samsung Electronics Co. , Ltd. (South Korea) )
  • Tominaga, J. ( National Institute of Advanced Industrial Science and Technology(Japan) )
Publication title:
Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5662
Pub. Year:
2004
Page(from):
51
Page(to):
56
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456236 [0819456233]
Language:
English
Call no.:
P63600/5662
Type:
Conference Proceedings

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