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Self-assembled silicon nanostructure growth by electron beam annealing

Author(s):
Johnson, S. ( Institute of Geological and Nuclear Sciences Ltd. (New Zealand) )
Markwitz, A. ( Institute of Geological and Nuclear Sciences Ltd. (New Zealand) and MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand) )
Rudolphi, M. ( J. W. Goethe Univ. (Germany) )
Baumann, H. ( J. W. Goethe Univ. (Germany) )
Kuo, P.-Y. ( Univ. of Canterbury (New Zealand) )
Blaikie, R. ( MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand) and Univ. of Canterbury (New Zealand) )
1 more
Publication title:
Smart materials III : 13-15 December 2004, Sydney, Australia
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5648
Pub. date:
2004
Page(from):
294
Page(to):
300
Pages:
7
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456083 [081945608X]
Language:
English
Call no.:
P63600/5648
Type:
Conference Proceedings

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