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Resolution enhancement in optical lithography with chromium wire-grid polarization mask

Author(s):
  • Yu, G. ( Institute of Optics and Electronics, CAS (China) )
  • Lin, W. ( Institute of Optics and Electronics, CAS (China) )
  • Xing, T. ( Institute of Optics and Electronics, CAS (China) )
  • Yao, H. ( Institute of Optics and Electronics, CAS (China) )
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. date:
2004
Page(from):
122
Page(to):
129
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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