Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
- Author(s):
Lee, B. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Hung, R. ( Nanya Technology Corp. (Taiwan) ) Lin, O. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Wu, Y.-H. ( Nanya Technology Corp. (Taiwan, China) ) Kozuma, M. ( Toppan Chunghwa Electronics Corp. (Taiwan, China) ) Shih, C.-L. ( Nanya Technology Corp. (Taiwan, China) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Hsu, S. D. ( ASML MaskTools, Inc. (USA) ) - Publication title:
- Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5645
- Pub. Year:
- 2004
- Page(from):
- 114
- Page(to):
- 121
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819456007 [0819456004]
- Language:
- English
- Call no.:
- P63600/5645
- Type:
- Conference Proceedings
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