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Etching analysis of inductively coupled plasma technology for fabrication of micro-optical elements

Author(s):
  • Wang, S. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Zhou, C. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Ru, H. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Zhang, Y. ( Shanghai Institute of Optics and Fine Mechanics (China) )
Publication title:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5645
Pub. date:
2004
Page(from):
84
Page(to):
93
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
Language:
English
Call no.:
P63600/5645
Type:
Conference Proceedings

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