Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging

Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging

Author(s):

Chiou, T.-B. ( ASML Taiwan Ltd. (Taiwan, China) )
Chen, A. C. ( ASML Taiwan Ltd. (Taiwan, China) )
Hsu, S. D. ( ASML MaskTools, Inc.(USA) )
Eurlings, M. ( ASML Netherlands B.V. (Netherlands) )
Hendrickx, E. ( IMEC (Belgium) )

Publication title:

Advanced microlithography technologies : 8-10 November, 2004, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5645

Pub. Year:

2004

Page(from):

21

Page(to):

31

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456007 [0819456004]

Language:

English

Call no.:

P63600/5645

Type:

Conference Proceedings

Details

TDL ID:	ZA00014861
Series ID:	PA00000029
Conf. info. (Name):	Photonics Asia : Advanced microlithography technologies
Conf. info. (Number):	2004
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2004.11.08-2004.11.10

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