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Intermixing of InGaAs-InGaAs lattice-matched and strained quantum well structures using pre-annealing enhanced defects diffusion technique (Invited Paper)

Author(s):
  • Wang, R. ( Phosistor Technologies, Inc. (USA) )
  • Shi, Y. ( Phosistor Technologies, Inc. (USA) and Agilecom Fiber Solution Inc. (USA) )
  • Ooi, B. S. ( Phosistor Technologies, Inc. (USA) and Lehigh Univ. (USA) )
Publication title:
Optoelectronic Devices and Integration
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5644
Pub. Year:
2004
Page(from):
79
Page(to):
86
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455994 [0819455997]
Language:
English
Call no.:
P63600/5644-1
Type:
Conference Proceedings

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